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Dang Xin-Zhi, Zhang Ren-Gang, Zhang Peng, Yu Run-Sheng, Kuang Peng, Cao Xing-Zhong, Wang Bao-Yi. Effect of different sulfur pressure annealing on properties of sputtering-deposited ZnS thin films. Acta Physica Sinica,
2023, 72(3): 034207.
doi: 10.7498/aps.72.20221737
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Liao Dun-Wei, Zheng Yue-Jun, Chen Qiang, Ding Liang, Gao Mian, Fu Yun-Qi. Preparation and performance improvement of metal grid transparent conductive film based on crack template method. Acta Physica Sinica,
2022, 71(15): 154201.
doi: 10.7498/aps.71.20220101
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Chen Ming, Zhou Xi-Ying, Mao Xiu-Juan, Shao Jia-Jia, Yang Guo-Liang. Influence of external magnetic field on properties of aluminum-doped zinc oxide films prepared by RF magnetron sputtering. Acta Physica Sinica,
2014, 63(9): 098103.
doi: 10.7498/aps.63.098103
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Jiang Qiang, Mao Xiu-Juan, Zhou Xi-Ying, Chang Wen-Long, Shao Jia-Jia, Chen Ming. Influence of applied magnetic field on properties of silicon nitride thin film with light trapping structure prepared by R.F. magnetron sputtering. Acta Physica Sinica,
2013, 62(11): 118103.
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Tong Guo-Xiang, Li Yi, Wang Feng, Huang Yi-Ze, Fang Bao-Ying, Wang Xiao-Hua, Zhu Hui-Qun, Liang Qian, Yan Meng, Qin Yuan, Ding Jie, Chen Shao-Juan, Chen Jian-Kun, Zheng Hong-Zhu, Yuan Wen-Rui. Preparation of W-doped VO2/FTO composite thin films by DC magnetron sputtering and characterization analyses of the films. Acta Physica Sinica,
2013, 62(20): 208102.
doi: 10.7498/aps.62.208102
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Zhang Chuan-Jun, Wu Yun-Hua, Cao Hong, Gao Yan-Qing, Zhao Shou-Ren, Wang Shan-Li, Chu Jun-Hao. Effects of different substrates and CdCl2 treatment on the properties of CdS thin films deposited by magnetron sputtering. Acta Physica Sinica,
2013, 62(15): 158107.
doi: 10.7498/aps.62.158107
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Yang Duo, Zhong Ning, Shang Hai-Long, Sun Shi-Yang, Li Ge-Yang. Microstructures and mechanical properties of (Ti, N)/Al nanocomposite films by magnetron sputtering. Acta Physica Sinica,
2013, 62(3): 036801.
doi: 10.7498/aps.62.036801
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Su Yuan-Jun, Xu Jun, Zhu Ming, Fan Peng-Hui, Dong Chuang. Hydrogenated poly-crystalline silicon thin films deposited by inductively coupled plasma assisted pulsed dc twin magnetron sputtering. Acta Physica Sinica,
2012, 61(2): 028104.
doi: 10.7498/aps.61.028104
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Wang Yong-Jun, Li Hong-Xuan, Ji Li, Liu Xiao-Hong, Wu Yan-Xia, Zhou Hui-Di, Chen Jian-Min. Preparation and properties of graphite-like carbon films fabricated by unbalanced magnetron sputtering. Acta Physica Sinica,
2012, 61(5): 056103.
doi: 10.7498/aps.61.056103
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Ju Dong-Ying, Ding Wan-Yu, Chai Wei-Ping, Wang Hua-Lin. Composition and crystal structure of N doped TiO2 film deposited with different O2 flow rates. Acta Physica Sinica,
2011, 60(2): 028105.
doi: 10.7498/aps.60.028105
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Cao Yue-Hua, Di Guo-Qing. Analysis of Y2O3 doped TiO2 films topography prepared by radio frequency magnetron sputtering. Acta Physica Sinica,
2011, 60(3): 037702.
doi: 10.7498/aps.60.037702
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Li Lin-Na, Chen Xin-Liang, Wang Fei, Sun Jian, Zhang De-Kun, Geng Xin-Hua, Zhao Ying. Effects of hydrogen flux on aluminum doped zinc thin films by pulsed magnetron sputtering. Acta Physica Sinica,
2011, 60(6): 067304.
doi: 10.7498/aps.60.067304
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Ding Wan-Yu, Xu Jun, Lu Wen-Qi, Deng Xin-Lu, Dong Chuang. An XPS study on the structure of SiNx film deposited by microwave ECR magnetron sputtering. Acta Physica Sinica,
2009, 58(6): 4109-4116.
doi: 10.7498/aps.58.4109
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Li Yue-Fu, Ye Hui, Fu Xing-Hai. RF magnetron sputtering deposition growth of highly orientated strontium barium niobate thin films. Acta Physica Sinica,
2008, 57(2): 1229-1235.
doi: 10.7498/aps.57.1229
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Liu Feng, Meng Yue-Dong, Ren Zhao-Xing, Shu Xing-Sheng. Characterization of ZrN films deposited by ICP enhanced RF magnetron sputtering. Acta Physica Sinica,
2008, 57(3): 1796-1801.
doi: 10.7498/aps.57.1796
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. The effect of temperature of substrate and oxygen partial pressure on V2O5 films fabricated by magnetron sputtering. Acta Physica Sinica,
2007, 56(12): 7255-7261.
doi: 10.7498/aps.56.7255
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Liu Zhi-Wen, Gu Jian-Feng, Sun Cheng-Wei, Zhang Qing-Yu. Study on nucleation and dynamic scaling of morphological evolution of ZnO film deposition by reactive magnetron sputtering. Acta Physica Sinica,
2006, 55(4): 1965-1973.
doi: 10.7498/aps.55.1965
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Ding Wan-Yu, Xu Jun, Li Yan-Qin, Piao Yong, Gao Peng, Deng Xin-Lü, Dong Chuang. Characterization of silicon nitride films prepared by MW-ECR magnetron sputtering. Acta Physica Sinica,
2006, 55(3): 1363-1368.
doi: 10.7498/aps.55.1363
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Zhou Xiao-Li, Du Pi-Yi. CaCu33Ti44O1212 films prepared by magnetron s puttering. Acta Physica Sinica,
2005, 54(4): 1809-1813.
doi: 10.7498/aps.54.1809
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2002, 51(2): 406-409.
doi: 10.7498/aps.51.406
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