\begin{document}$ {\text{O}}_2^ + $\end{document} molecular ions which are mainly created from the ionization process of O2 molecules. Similarly, the high density of O2 molecules also enhances the production of \begin{document}${{{\mathrm{O}}} _2}\left( {{{\mathrm{a}}^1}{\Delta _{\mathrm{g}}}} \right)$\end{document} molecules through the excitation process and O ions through the dissociation attachment reaction. On the contrary, more electrons are consumed via the collisions between electrons and O2 molecules or \begin{document}$ {\text{O}}_2^ + $\end{document} molecular ions. Therefore, the electron density obtained in the Cu reactor is highest. The density of Ar+ ions and Arm atoms also increase with sticking coefficient decreasing. The density of O+ ions and \begin{document}$ {\text{O}}_2^ + $\end{document} molecular ions peak below the coil in the stainless steel reactor, whereas the radial uniformities are improved in the Cu reactor. In the three reactors, the electrons distribute evenly at the reactor center region. The O density and \begin{document}${{{\mathrm{O}}} _2}\left( {{{\mathrm{a}}^1}{\Delta _{\mathrm{g}}}} \right)$\end{document} density significantly peak at the reactor center, while the maximum value of Ar+ density and Arm density are below the coil. As for O(1D), the maximum density below the coil region moves toward the reactor center as the reactor material changes from stainless steel to Cu. Finally, the effect of sticking coefficient of O→1/2O2 is studied. The results show that the O atom density decreases with the sticking coefficient increasing, but the opposite trend is observed in O2 molecular density. It is noticed that the sticking coefficient has little effect on species density when it is higher than 0.5."> Numerical simulation of inductively coupled Ar/O<sub>2</sub> plasma - 必威体育下载

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    Zhang Yu-Han, Zhao Xin-Qian, Liang Ying-Shuang, Guo Yuan-Yuan
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    • Abstract views:681
    • PDF Downloads:37
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    Publishing process
    • Received Date:26 March 2024
    • Accepted Date:30 April 2024
    • Available Online:25 May 2024
    • Published Online:05 July 2024

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