[1] |
Hu Xiao-Chuan, Liu Yang-Xi, Chu Kun, Duan Chao-Feng.Effect of amorphous carbon film on secondary electron emission of metal. Acta Physica Sinica, 2024, 73(4): 047901.doi:10.7498/aps.73.20231604 |
[2] |
Zhang Han-Tian, Zhou Qian-Hong, Zhou Hai-Jing, Sun Qiang, Song Meng-Meng, Dong Ye, Yang Wei, Yao Jian-Sheng.Effect of secondary electrons on SGEMP response. Acta Physica Sinica, 2021, 70(16): 165201.doi:10.7498/aps.70.20210461 |
[3] |
Chen Long, Sun Shao-Juan, Jiang Bo-Rui, Duan Ping, An Yu-Hao, Yang Ye-Hui.Characteristics of non-Maxwellian magnetized sheath with secondary electron emission. Acta Physica Sinica, 2021, 70(24): 245201.doi:10.7498/aps.70.20211061 |
[4] |
Zhao Xiao-Yun, Zhang Bing-Kai, Wang Chun-Xiao, Tang Yi-Jia.Effects ofq-nonextensive distribution of electrons on secondary electron emission in plasma sheath. Acta Physica Sinica, 2019, 68(18): 185204.doi:10.7498/aps.68.20190225 |
[5] |
Wang Dan, Ye Ming, Feng Peng, He Yong-Ning, Cui Wan-Zhao.An effective reduction on secondary electron emission yield of gold coated surfaces by laser etching. Acta Physica Sinica, 2019, 68(6): 067901.doi:10.7498/aps.68.20181547 |
[6] |
Lin Shu, Xia Ning, Wang Hong-Guang, Li Yong-Dong, Liu Chun-Liang.Multipactor susceptibility chart of coaxial transmission lines with stationary statistical modeling. Acta Physica Sinica, 2018, 67(22): 227901.doi:10.7498/aps.67.20181341 |
[7] |
Hu Jing, Cao Meng, Li Yong-Dong, Lin Shu, Xia Ning.Optimization of surface morphology with micro meter size for suppressing secondary electron emission. Acta Physica Sinica, 2018, 67(17): 177901.doi:10.7498/aps.67.20180466 |
[8] |
Bai Chun-Jiang, Feng Guo-Bao, Cui Wan-Zhao, He Yong-Ning, Zhang Wen, Hu Shao-Guang, Ye Ming, Hu Tian-Cun, Huang Guang-Sun, Wang Qi.Suppressing second electron yield based on porous anodic alumina. Acta Physica Sinica, 2018, 67(3): 037902.doi:10.7498/aps.67.20172243 |
[9] |
Zhang Na, Cao Meng, Cui Wan-Zhao, Hu Tian-Cun, Wang Rui, Li Yun.Analytical model of secondary electron yield from metal surface with regular structures. Acta Physica Sinica, 2015, 64(20): 207901.doi:10.7498/aps.64.207901 |
[10] |
Xiong Ying, Wen Qi-Ye, Tian Wei, Mao Qi, Chen Zhi, Yang Qing-Hui, Jing Yu-Lan.Researches on the electrical properties of vanadium oxide thin films on Si substrates. Acta Physica Sinica, 2015, 64(1): 017102.doi:10.7498/aps.64.017102 |
[11] |
Li Yong-Dong, Yan Yang-Jiao, Lin Shu, Wang Hong-Guang, Liu Chun-Liang.A fast single particle Monte-Carlo method of computing the breakdown threshold of multipactor in microwave device. Acta Physica Sinica, 2014, 63(4): 047902.doi:10.7498/aps.63.047902 |
[12] |
Li Yong-Dong, Yang Wen-Jin, Zhang Na, Cui Wan-Zhao, Liu Chun-Liang.A combined phenomenological model for secondary electron emission. Acta Physica Sinica, 2013, 62(7): 077901.doi:10.7498/aps.62.077901 |
[13] |
Yang Wen-Jin, Li Yong-Dong, Liu Chun-Liang.Model of secondary electron emission at high incident electron energy for metal. Acta Physica Sinica, 2013, 62(8): 087901.doi:10.7498/aps.62.087901 |
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He Yue, Dou Ya-Nan, Ma Xiao-Guang, Chen Shao-Bin, Chu Jun-Hao.Passivation and stability of thermal atomic layer deposited Al2O3 on CZ-Si. Acta Physica Sinica, 2012, 61(24): 248102.doi:10.7498/aps.61.248102 |
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Liu Min, Yu Hua, Zhang Pan, Zhang Ming, Liu Yan, Zhao Li-Juan.Effects of Al2O3 on micro-structure and crystallization of oxyfluoride glass. Acta Physica Sinica, 2012, 61(11): 118102.doi:10.7498/aps.61.118102 |
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Liu Wei-Yuan, Yue Han, Wang Shuai, Liu Zhong-Wei, Chen Qiang, Dong Li-Fang, Yang Yu-Jie.Characteristics of dielectric barrier discharge with different dielectric layer structures. Acta Physica Sinica, 2011, 60(2): 025216.doi:10.7498/aps.60.025216 |
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Wang Li-Shi, Pan Chun-Xu, Cai Qi-Zhou, Wei Bo-Kang.Study of the heat effect of single steady-state microdischarge during plasma electrolytic oxidation. Acta Physica Sinica, 2007, 56(9): 5341-5346.doi:10.7498/aps.56.5341 |
[18] |
Zhou Bing-Qing, Liu Feng-Zhen, Zhu Mei-Fang, Gu Jin-Hua, Zhou Yu-Qin, Liu Jin-Long, Dong Bao-Zhong, Li Guo-Hua, Ding Kun.The microstructure of hydrogenated microcrystalline silicon thin films studied by small-angle x-ray scattering. Acta Physica Sinica, 2005, 54(5): 2172-2175.doi:10.7498/aps.54.2172 |
[19] |
Li Xiao-Xi, Jia Tian-Qing, Feng Dong-Hai, Xu Zhi-Zhan.The mechanism of ablation of sapphire by an ultra-short pulse laser. Acta Physica Sinica, 2004, 53(7): 2154-2158.doi:10.7498/aps.53.2154 |
[20] |
Wang Yong-Qian, Chen Wei-De, Chen Chang-Yong, Diao Hong-Wei, Zhang Shi-Ben, Xu Yan-Yue, Kong Guang-Lin, Liao Xian-Bo.. Acta Physica Sinica, 2002, 51(7): 1564-1570.doi:10.7498/aps.51.1564 |