[1] |
Bai Gang, Han Yu-Hang, Gao Cun-Fa.Phase transitions and electrocaloric effects of (111)-oriented K0.5Na0.5NbO3epitaxial films: effect of external stress and misfit strains. Acta Physica Sinica, 2022, 71(9): 097701.doi:10.7498/aps.71.20220234 |
[2] |
Lu Bin, Wang Da-Wei, Chen Yu-Lei, Cui Yan, Miao Yuan-Hao, Dong Lin-Peng.Capacitance model for nanowire gate-all-around tunneling field-effect-transistors. Acta Physica Sinica, 2021, 70(21): 218501.doi:10.7498/aps.70.20211128 |
[3] |
Lin Cui, Bai Gang, Li Wei, Gao Cun-Fa.Strain tuning of negative capacitance in epitaxial PbZr0.2Ti0.8O3thin films. Acta Physica Sinica, 2021, 70(18): 187701.doi:10.7498/aps.70.20210810 |
[4] |
Li Hua-Mei, Hou Peng-Fei, Wang Jin-Bin, Song Hong-Jia, Zhong Xiang-Li.Single-event-upset effect simulation of HfO2-based ferroelectric field effect transistor read and write circuits. Acta Physica Sinica, 2020, 69(9): 098502.doi:10.7498/aps.69.20200123 |
[5] |
Chen Jun-Dong, Han Wei-Hua, Yang Chong, Zhao Xiao-Song, Guo Yang-Yan, Zhang Xiao-Di, Yang Fu-Hua.Recent research progress of ferroelectric negative capacitance field effect transistors. Acta Physica Sinica, 2020, 69(13): 137701.doi:10.7498/aps.69.20200354 |
[6] |
Hao Min-Ru, Hu Hui-Yong, Liao Chen-Guang, Wang Bin, Zhao Xiao-Hong, Kang Hai-Yang, Su Han, Zhang He-Ming.Influence of -ray total dose radiation effect on the tunneling gate current of the uniaxial strained Si nanometer n-channel metal-oxide-semiconductor field-effect transistor. Acta Physica Sinica, 2017, 66(7): 076101.doi:10.7498/aps.66.076101 |
[7] |
Lü Yi, Zhang He-Ming, Hu Hui-Yong, Yang Jin-Yong, Yin Shu-Juan, Zhou Chun-Yu.A model of capacitance characteristic for uniaxially strained Si N-metal-oxide-semiconductor field-effect transistor. Acta Physica Sinica, 2015, 64(6): 067305.doi:10.7498/aps.64.067305 |
[8] |
Liu Xiang-Yu, Hu Hui-Yong, Zhang He-Ming, Xuan Rong-Xi, Song Jian-Jun, Shu Bin, Wang Bin, Wang Meng.Study on the strained SiGe p-channel metal-oxide-semiconductor field-effect transistor with polycrystalline silicon germanium gate threshold voltage. Acta Physica Sinica, 2014, 63(23): 237302.doi:10.7498/aps.63.237302 |
[9] |
Hu Hui-Yong, Liu Xiang-Yu, Lian Yong-Chang, Zhang He-Ming, Song Jian-Jun, Xuan Rong-Xi, Shu Bin.Study on the influence of γ -ray total dose radiation effect on the threshold voltage and transconductance of the strained Si p-channel metal-oxide-semiconductor field-effect transistor. Acta Physica Sinica, 2014, 63(23): 236102.doi:10.7498/aps.63.236102 |
[10] |
Xin Yan-Hui, Liu Hong-Xia, Wang Shu-Long, Fan Xiao-Jiao.Two-dimensional analytical models for the symmetrical triple-material double-gate strained Si MOSFETs. Acta Physica Sinica, 2014, 63(14): 148502.doi:10.7498/aps.63.148502 |
[11] |
Zhou Chun-Yu, Zhang He-Ming, Hu Hui-Yong, Zhuang Yi-Qi, Lü Yi, Wang Bin, Wang Guan-Yu.Charge model of strained Si NMOSFET. Acta Physica Sinica, 2014, 63(1): 017101.doi:10.7498/aps.63.017101 |
[12] |
Shao Qing-Sheng, Liu Shi-Yu, Zhao Hui, Yu Da-Shu, Cao Mao-Sheng.First-principles study of structural stability and electronic properties of rhombohedral and tetragonal PbZr0.5Ti0.5O3. Acta Physica Sinica, 2012, 61(4): 047103.doi:10.7498/aps.61.047103 |
[13] |
Zhao Geng, Cheng Xiao-Man, Tian Hai-Jun, Du Bo-Qun, Liang Xiao-Yu, Wu Feng.The influence of modified electrodes by V2O5 film on the performance of ambipolar organic field-effect transistors based on C60/Pentacene. Acta Physica Sinica, 2012, 61(21): 218502.doi:10.7498/aps.61.218502 |
[14] |
, Zhao Su-Ling, Xu Zheng, Yao Jiang-Feng, Zhang Fu-Jun, Tian Xue-Yan.Non-solvent addition induced self-organization for enhancement of performance of poly(3-hexylthiophene) organic field-effect transistors. Acta Physica Sinica, 2011, 60(3): 037201.doi:10.7498/aps.60.037201 |
[15] |
Li Bin, Liu Hong-Xia, Yuan Bo, Li Jin, Lu Feng-Ming.Model of electron mobility in inversion layer of strained Si/Si1-xGex n type metal-oxide-semiconductor field-effect transistors. Acta Physica Sinica, 2011, 60(1): 017202.doi:10.7498/aps.60.017202 |
[16] |
Wu Tie-Feng, Zhang He-Ming, Wang Guan-Yu, Hu Hui-Yong.Gate tunneling current predicting model of strained Si for scaled metal-oxide semiconductor field effect transistor. Acta Physica Sinica, 2011, 60(2): 027305.doi:10.7498/aps.60.027305 |
[17] |
Liu Hong-Xia, Yin Xiang-Kun, Liu Bing-Jie, Hao Yue.Threshold voltage analytic model for strained SiGe-on-insulator p-channel metal-oxide-semiconductor-field-effect-transistor. Acta Physica Sinica, 2010, 59(12): 8877-8882.doi:10.7498/aps.59.8877 |
[18] |
Wang Xiu-Zhang, Liu Hong-Ri.Enhanced ferroelectricity of Pb(Zr0.5Ti0.5)O3 film by the introduction of La0.3Sr0.7TiO3 template layer. Acta Physica Sinica, 2007, 56(3): 1735-1740.doi:10.7498/aps.56.1735 |
[19] |
Chen Chang-Hong, Huang De-Xiu, Zhu Peng.Infrared absorption of VO2 based Mott transition field effect transistor dependent on optical phonon in α-SiN: H films. Acta Physica Sinica, 2007, 56(9): 5221-5226.doi:10.7498/aps.56.5221 |
[20] |
Wang Hua, Ren Ming-Fang.Memory characteristics of metal-ferroelectric-semiconductor field-effect-transistors with Ag/Bi4Ti3O12/p-Si gate. Acta Physica Sinica, 2006, 55(3): 1512-1516.doi:10.7498/aps.55.1512 |