- 必威体育下载

姓名
邮箱
手机号码
标题
留言内容
验证码

Abstract

High-power pulsed magnetron sputtering (HiPIMS) can produce high density and high adhesion coatings due to the high ionization. However, industrial application of HiPIMS is limited because of the unstable discharge and small deposition rate. A cylindrical cathode, developed on the basis of hollow cathode effect, can improve the discharge stability. With the development of electromagnetic systems, the plasma transport is improved, and thus increasing the deposition rate significantly. However, the introduction of electromagnetic system leads the strong discharge and large etching area on the target to be incompatibly controlled. In this work, the distribution of the tangential and longitudinal magnetic field on the target surface are improved by adding external magnets, and their effects on the plasma discharge are studied. By optimizing the magnets, the tangential magnetic field on the target surface becomes stronger and more uniform. Meanwhile, the peak of the longitudinal magnetic field increases from 73 to 96 mT and the peak location expands to two-sides of the cathode. The simulation result shows that the target etching area described by the proportion of the target area with the tangential magnetic field intensity higher than 40 mT increases from 51% to 67%, and the HiPIMS discharge studied by the particle in cell/Monte Carlo collision (PIC/MCC) method and plasma global model shows that the ion current and spectral intensity are significantly enhanced, exhibiting a doubled Cr density of 2.6 × 10 ²⁰m ^–3and an increased ionization from 90% to 92.1%. The practical Ar/Cr HiPIMS discharge is carried out separately with the original and optimized cylindrical cathode, and the results reveal that the brightness of plasma glow, the target current and the etching area all increase after the improvement. Furthermore, the ion current and the optical emission spectrum suggest that the flux of ions arriving at the substrate is approximately doubled, which means that an about doubled deposition rate of the optimized cathode is achievable.

Keywords:

Authors and contacts

Corresponding author:Wu Zhong-Zhen,wuzz@pkusz.edu.cn

Funds:Project supported by the Postdoctoral Innovative Talent Support Program, China (Grant No. BX20190001), City University of Hong Kong Strategic Research Grant (SRG) (Grant No. 7005264), and Guangdong-Hong Kong Technology Cooperation Funding Scheme (TCFS) (Grant No. GHP/085/18SZ).

FullText HTML: translate this paragraph

References

[1]
[2]
[3]
[4]
[5]
[6]
[7]
[8]
[9]
[10]
[11]
[12]
[13]
[14]
[15]
[16]
[17]
[18]
[19]
[20]
[21]
[22]
[23]
[24]
[25]
[26]
[27]
[28]
[29]
[30]
[31]
[32]

Cited By

DownLoad: Full-Size Img PowerPoint

反应方程式	反应能量/eV	反应类型
${{{\rm e}}} + {{\rm Ar}} \to {{\rm Ar}} + {{{\rm e}}}$	—	弹性
${{{\rm e}}} + {{\rm Ar}} \to {{\rm A}}{{{\rm r}}^ + } + 2{{{\rm e}}}$	15.76	电离
${{{\rm e}}} + {{\rm Ar}} \to {{\rm A}}{{{\rm r}}^m} + {{{\rm e}}}$	11.56	激发
${{{\rm e}}} + {\operatorname{Ar} ^m} \to {{\rm Ar}} + {{{\rm e}}}$	–11.56	退激发
${{{\rm e}}} + {{\rm A}}{{{\rm r}}^m} \to {{\rm A}}{{{\rm r}}^ + } + 2{{{\rm e}}}$	4.2	电离
${{\rm A}}{{{\rm r}}^ + } + {{\rm Ar}} \to {{\rm A}}{{{\rm r}}^ + } + {{\rm Ar}}$	—	弹性
${{\rm A}}{{{\rm r}}^ + } + {{\rm Ar}} \to {{\rm Ar}} + {{\rm A}}{{{\rm r}}^ + }$	—	电荷交换

DownLoad: CSV

[1]
[2]
[3]
[4]
[5]
[6]
[7]
[8]
[9]
[10]
[11]
[12]
[13]
[14]
[15]
[16]
[17]
[18]
[19]
[20]
[21]
[22]
[23]
[24]
[25]
[26]
[27]
[28]
[29]
[30]
[31]
[32]

[1]	Gao Jian-Ying, Li Yu-Ge, Lei Ming-Kai.Plasma characteristics in deep oscillation magnetron sputtering of chromium target. Acta Physica Sinica, 2024, 73(16): 165201.doi:10.7498/aps.73.20240364
[2]	Zhang Tian-Cheng, Chen Di-Na, Li Chun-Yu, Zhang Li-Min, Xu Zu-Yin, Cheng Ai-Qiang, Bao Hua-Guang, Ding Da-Zhi.Efficient field-circuit co-simulation method for GaN-based high power microwave devices. Acta Physica Sinica, 2023, 72(14): 147101.doi:10.7498/aps.72.20230452
[3]	Xie Bing-Hong, Xu Guo-Kai, Xiao Shao-Qiu, Yu Zhong-Jun, Zhu Da-Li.Resonance magnetoelectric effect analysis and output power optimization of nonlinear magnetoelectric transducer model. Acta Physica Sinica, 2023, 72(11): 117501.doi:10.7498/aps.72.20222277
[4]	Chen Chang-Zi, Ma Dong-Lin, Li Yan-Tao, Leng Yong-Xiang.Discharge model and plasma characteristics of high-power pulsed magnetron sputtering titanium target. Acta Physica Sinica, 2021, 70(18): 180701.doi:10.7498/aps.70.20202050
[5]	Shen Yong-Qing, Zhang Zhi-Qiang, Liao Bin, Wu Xian-Ying, Zhang Xu, Hua Qing-Song, Bao Man-Yu.Tribocorrosion performance of Nitrogen-doped diamond like carbon coating by high power impulse magnetron sputtering technique. Acta Physica Sinica, 2020, 69(10): 108101.doi:10.7498/aps.69.20200021
[6]	Cui Sui-Han, Wu Zhong-Zhen, Xiao Shu, Chen Lei, Li Ti-Jun, Liu Liang-Liang, Ricky K Y Fu, Tian Xiu-Bo, Paul K Chu, Tan Wen-Chang.Simulation study on plasma discharge and transport in cylindrical cathode controlled by expanding electromagnetic field. Acta Physica Sinica, 2019, 68(19): 195204.doi:10.7498/aps.68.20190583
[7]	Wang Tian-Long, Qiu Qing-Quan, Jing Li-Wei, Zhang Xiao-Bo.Design of circular composite sputtering cathode and simulation of its discharge characteristics. Acta Physica Sinica, 2018, 67(7): 070703.doi:10.7498/aps.67.20172576
[8]	Cui Sui-Han, Wu Zhong-Zhen, Xiao Shu, Liu Liang-Liang, Zheng Bo-Cong, Lin Hai, Ricky K Y Fu, Tian Xiu-Bo, Paul K, Tan Wen-Chang, Pan Feng.Electromagnetic control and optimization of high power impulse magnetron sputtering discharges in cylindrical source. Acta Physica Sinica, 2017, 66(9): 095203.doi:10.7498/aps.66.095203
[9]	Xiao Shu, Wu Zhong-Zhen, Cui Sui-Han, Liu Liang-Liang, Zheng Bo-Cong, Lin Hai, Ricky K Y Fu, Tian Xiu-Bo, Pan Feng, Paul K Chu.Cylindric high power impulse magnetron sputtering source and its discharge characteristics. Acta Physica Sinica, 2016, 65(18): 185202.doi:10.7498/aps.65.185202
[10]	Zheng Shi-Yan.Power output and efficiency of irreversible regenerative Stirling heat engine using generalized Redlich-Kwong gas as the working substance. Acta Physica Sinica, 2014, 63(17): 170508.doi:10.7498/aps.63.170508
[11]	Wu Zhong-Zhen, Tian Xiu-Bo, Li Chun-Wei, Ricky K. Y., Fu, Pan Feng.Phasic discharge characteristics in high power pulsed magnetron sputtering. Acta Physica Sinica, 2014, 63(17): 175201.doi:10.7498/aps.63.175201
[12]	Wu Zhong-Zhen, Tian Xiu-Bo, Pan Feng, Ricky K. Y. Fu, Paul K. Chu.Enhanced discharge of high power pulsed magnetron sputtering coupling with high voltage. Acta Physica Sinica, 2014, 63(18): 185207.doi:10.7498/aps.63.185207
[13]	Xie Chen, Hu Ming-Lie, Xu Zong-Wei, Wu Wei, Gao Hai-Feng, Zhang Da-Peng, Qin Peng, Wang Yi-Sen, Wang Qing-Yue.High power bessel ultrashort pulses directly output from a fiber laser system. Acta Physica Sinica, 2013, 62(6): 064203.doi:10.7498/aps.62.064203
[14]	Shen Xiang-Qian, Xie Quan, Xiao Qing-Quan, Chen Qian, Feng Yun.Computer simulation of the glow discharge characteristics in magnetron sputtering. Acta Physica Sinica, 2012, 61(16): 165101.doi:10.7498/aps.61.165101
[15]	Wang Gan-Ping, Xiang Fei, Tan Jie, Cao Shao-Yun, Luo Min, Kang Qiang, Chang An-Bi.Investigation in discharge progress of a long pulse high power microwave-driven source. Acta Physica Sinica, 2011, 60(7): 072901.doi:10.7498/aps.60.072901
[16]	Mu Zong-Xin, Mu Xiao-Dong, Wang Chun, Jia Li, Dong Chuang.Analysis on the ionization of high power pulsed unbalanced magnetron sputtering powered by direct current. Acta Physica Sinica, 2011, 60(1): 015204.doi:10.7498/aps.60.015204
[17]	Liu Yan-Ge, Zhang Chun-Shu, Sun Ting-Ting, Lu Yun-Fei, Wang Zhi, Yuan Shu-Zhong, Kai Gui-Yun, Dong Xiao-Yi.Clad-pumped Er3+/Yb3+-codoped short pulse fiber laser with high average power output exceeding 2W. Acta Physica Sinica, 2006, 55(9): 4679-4685.doi:10.7498/aps.55.4679
[18]	Yang Ming-Liang, Wang Yi-Zhong, Lai Wu-Yan.. Acta Physica Sinica, 1995, 44(9): 1504-1508.doi:10.7498/aps.44.1504
[19]	CHEN JIAN-WEN, FU SHU-FEN, LIU MIAO-HONG.ELECTRIC DISCHARGE PUMPED XeBr LASER WITH HIGH POWER AND HIGH EFFICIENCY. Acta Physica Sinica, 1980, 29(6): 799-802.doi:10.7498/aps.29.799
[20]	CHANG ZUNG-KUI, YEH MOW-FOH.PULSED ELECTRODELESS DISCHARGE AS A LIGHT SOURCE FOR LASER EXCITATION AND OBSERVATION OF THE CHARACTERISTICS OF LASER OUTPUT. Acta Physica Sinica, 1966, 22(2): 174-182.doi:10.7498/aps.22.174

Catalog

Vol. 70, Issue 4 - 2021-02-20

Metrics

Abstract views:6038
PDF Downloads:134
Cited By:0

Search

Article