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张瑶, 汤善治, 李明, 王立超, 高俊祥

Present research status of piezoelectric bimorph mirrors in synchrotron radiation sources

Zhang Yao, Tang Shan-Zhi, Li Ming, Wang Li-Chao, Gao Jun-Xiang
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  • 反射镜是同步辐射光束线中应用广泛的光学元件之一, 双压电片反射镜由于具有结构简单、面形能动以及自适应可调等优点, 逐渐引起同步辐射界的重视. 本文综述了. 主要讨论了双压电片反射镜的工作原理和研究概况, 包括在几个大型同步辐射装置中的结构特点、制备技术及面形校正结果等; 简要介绍了双压电片反射镜面形校正时所采用的反射波前探测技术和反馈控制算法; 最后总结了其发展中存在的关键问题, 并展望了其未来的发展方向.
    The third-generation synchrotron radiation sources are widely used in physics, chemistry, material science, etc. due to their light beams with high brilliance and low emittance. In order to efficiently utilize such light beams for scientific research, reflective mirrors with excellent figure quality are required. The reflective mirrors on the beamlines of synchrotron radiation sources consist of fixed polished shape mirrors and bendable mirrors. Bendable mirrors have been attracting the attention of the synchrotron radiation community because their curvatures can be varied to realize different focusing properties. Classical bendable mirrors are realized by applying mechanical moment at the ends of the mirror substrates. In this paper, we introduce a new concept of bendable mirrors, X-ray adaptive mirrors which are based on the adaptive optics technology and the properties of piezoelectric bimorph systems. X-ray adaptive mirrors exhibit many advantages over the classical bendable mirrors, such as mechanics-free, figure local corrections, and good focusing properties. The piezoelectric bimorph mirrors have been used in astronomy to correct the wavefront distortions introduced by atmospheric turbulence in real time. The piezoelectric bimorph mirror was first introduced into the field of synchrotron radiation by European Synchrotron Radiation Facility (ESRF) in the 1990s for making an X-ray reflective mirror. Compared with astronomy community, synchrotron radiation community is not interested in high-speed wavefront correction, but looking for the ultimate precision of the surface shape of piezoelectric bimorph mirror. In the second part of this paper, the usual structure and working principle are briefly described. Piezoelectric bimorph mirrors are laminated structures consisting of two strips of an active material such as zirconate lead titanate (PZT) and two faceplates of a reflecting material such as silicon. A discrete or continuous control electrode is located between the interfaces of PZT-PZT, while two continuous ground electrodes are located between the interfaces of Si-PZT. The PZTs that are polarized normally to their surface, any voltage applied across the bimorph results in a different change of the lateral dimensions of two PZTs, thereby leading to a bending of the whole structure. The relationship between the curvature of the bending mirror and voltage is given. In the third part of this paper, the technical issues as well as the design concepts are discussed in detail. Several Si-PZT-PZT-Si bimorph mirrors are first fabricated and tested by ESRF. The dimensions of each of them are 150 mm in length, 4045 mm in width, and 1518 mm in thickness. PZT is selected as an active material because of its high coupling factor, high piezoelectric coefficient, and high Curie temperature. The faceplates need to be easy to polish such as silicon and silica. Owing to the symmetrical layered structure Si-PZT-PZT-Si, the mirror is less sensitive to temperature variations from the process of bonding and polishing. The bimorph mirrors are confirmed to be promising by experimental tests. As the state-of-art polishing technique, elastic emission machining (EEM) becomes available commercially, and diamond light source brings EEM into the bimorph mirror to achieve a novel adaptive X-ray mirror coupling adaptive zonal control with a super-smooth surface. This super-polished adaptive mirror becomes the first optics with a bendable ellipse with sub-nanometer figure error. Spring-8 fabricates an adaptive mirror with different structures, and two strips of PZTs are glued to the side faces of the mirror. This mirror shows a diffraction-limited performance. Finally, the wavefront measuring methods and control algorithm are introduced. Wavefront measuring devices used in the metrology cleanroom include long trace profiler, nanometer optics component measuring machine, and interferometer. At-wavelength measuring methods used on the beamline include pencil-beam method, phase retrieval method, X-ray speckle tracking technique, and Hartmann test. The wavefront control algorithm is aimed at obtaining the voltages applied according to the inverse of the interaction matrix.
        通信作者:李明,lim@ihep.ac.cn
      • 基金项目:国家自然科学基金青年科学基金(批准号: 11005123)资助的课题.
        Corresponding author:Li Ming,lim@ihep.ac.cn
      • Funds:Project supported by the Young Scientists Fund of the National Natural Science Foundation of China (Grant No. 11005123).
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    出版历程
    • 收稿日期:2015-08-22
    • 修回日期:2015-09-24
    • 刊出日期:2016-01-05

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