Ag ultrafine crystal films (AgUFCPs) of about 18nm thickness were deposited on a (111) monocrystalline silicon surface,by means of the vacuo-sputtering technique.The microstructure of AgUFCP and the interface morphology between the film and substrate were revealed by using of grazing incidence X-ray scattering (GIXS) method.A semi-crystalline structure of AgUFCP was- investigated by wide angle X-ray diffraction (WXRD) and radial distribution function(RDF).The surface atomic structure of Ag ultrafine crystal particle were analysed by DSC scans.and the temperature dependence of the growth dynamic mechanism of particle surface layer was explored.