High-power ( 200 kV), intense-current-density, low-emittance, high-brightness electron beam was generated in a 10 gap pseudospark chamber filled with 15 Pa N2 and driven by an improved pulse line accelerator. The ejected electron beam was characterized by 1mm diameter, 2. 2 kA beam current, and 400ns pulse length, and propagated 20cm in neutral N2 ionizing channel in the drift tube. At 5 cm downstream of the anode, it penetrated consecutively an acid-sensitive discoloring film and a 0.05 mm-thick copper foil, and left 0.6 mm and 0.3 mm holes on them, separately. According to the pinching equilibrium condition, the beam's normalized emittance and brightness are respectively calculated to be 23 πmm-mrad and 8×1010A/(m rad)2. That the 10 shots on the same acid-sensitive film produced a hole of 1. 6mm in diameter at 7cm showed a good repeatability of the electron beam. After 60 shots the pseudospark chamber was observed that there was almost no destructive damage traces left on the surfaces of the electrodes and insulators. It was found that the quality of electron beam produced in the pseudospark discharge chamber driven by the modified pulse line accelerator is much better than that generated by cold cathode discharges.