With the continuous advancement in micro-scale exploration, micro/nano fabrication technologies, represented by photolithography and various etching processes, have been widely applied in the manufacturing of micro- and nanoscale structures and devices. These advancements drive innovation in fields such as integrated circuits, micro-nano optoelectronic devices, and micro-electromechanical systems, while also bringing new opportunities to fundamental scientific research, including the study of microscopic property regulation mechanisms. In recent years, as an emerging micro-nano fabrication technology, thermal scanning probe lithography (t-SPL) has shown promise in applications related to the fabrication and property regulation of two-dimensional materials, as well as the creation of nanoscale grayscale structures, demonstrating unique advantages. By employing manufacturing methods such as material removal and modification, t-SPL can be used as an advanced technology for regulation of two-dimensional material properties, or directly effectively regulate various properties of two-dimensional materials, thereby significantly improving the performance of two-dimensional material devices, or advancing fundamental scientific research at the micro/nano scales. This paper will start with the principles and characteristics of t-SPL, analyze its recent research progress in the micro-nano fabrication and property modulation of two-dimensional materials, including several researches achieved by using t-SPL as the core manufacturing methods, such as direct patterning, strain engineering, and reaction kinetics research of two-dimensional materials. Finally, we will summarize the challenges in t-SPL technology, propose corresponding possible solutions, and explore the promising applications of this technology.