When energetic heavy ions are incident on negatively charged structure that collects and deposits ions, ion sputtering will occur. Metal wire is a structure commonly used for accelerating ions, the incidence of continuous high-throughput ions can cause surface loss of metal wire, affecting the service performance and lifespan of the metal wire. The SRIM software commonly used for calculating sputtering yield cannot consider the multi-body interaction problem contained in the alloy crystal structure. So, there is a significant error in calculating the sputtering yield of high-energy ions incident on alloy target. Based on the molecular dynamics method and Langevin temperature control model, the calculation model of ion sputtering parameters of energetic metal ions incident on alloy target is established in this work. The model is used to calculate the sputtering yield under the conditions of intact surface lattice of the target material and long-term incident surface lattice damage. The damages to the cathode metal wire under different incident ion fluences are further calculated, and the cross-sectional characterization of the metal wire is carried under typical working condition. The results show that the discrepancy between the experimental value and the theoretical value is less than 10%, which verifies the accuracy and applicability of the theoretical model. Based on this model, the search direction for sputtering resistant materials is proposed, meanwhile, a theoretical optimization is carried out to improve the service life of metal wire, and a method of using Ni-Ti alloy to improve the service life of metal wires is proposed, which is of great significance for predicting the service life of the metal wire under different conditions.