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拓扑物态是近年来在凝聚态科学领域快速兴起的一个分支, 其中二维拓扑绝缘体由于在基础研究和应用前景方面存在巨大潜力而受到广泛关注. 二维拓扑绝缘体具有绝缘性体态和导电性边界态, 其边界态受时间反演对称性保护, 不会被边界弱无序杂质所背散射, 从而形成无耗散的边界导电通道. 由于边界态只能沿着两个方向传播, 意味着比三维拓扑绝缘体有更少的散射通道和更强的稳定性, 对发展低能耗的集成电路意义重大. 在研究二维材料的诸多实验手段当中, 扫描隧道显微镜具有高空间与高能量分辨率测量, 能够局域地探测材料表面实空间的电子态结构, 直接探测到二维材料的边界态, 尤其适合表征其拓扑特性. 本文追溯了二维拓扑绝缘体的研究背景, 对当前广泛关注的几类研究体系, 从谱学方面详细展现一维边界态的非平庸拓扑特性. 结合理论计算证明: 一维拓扑边界态局域于材料的体能隙之内, 在晶体的边界处稳定存在, 并表现出一定的空间延展性. 最后介绍了通过结构和外场等手段对二维拓扑材料的物性进行调控, 展望了在未来自旋功能电子器件方面潜在的应用.Topological state is a rapidly emerging branch of condensed matter physics in recent years, among which two-dimensional topological insulators (2D TIs) have attracted wide attentions due to their great potential in basic research and applications. The 2D TI has insulating bulk state and conductive edge state. Its edge state is protected by time inversion symmetry and will not be backscattered by weak disordered impurities on the boundaries, thus forming a dissipationless edge conductive channel. Compared with 3D TIs, the edge state of 2D TIs can only propagate in two directions, meaning stronger anti-interference with robustness, thus is of great significance for the development of advanced integrated circuits with low energy consumption. Among many experimental methods for studying two-dimensional materials, scanning tunneling microscopy is a surface-sensitive tool with high atomic and energy resolution to locally detect the electronic structure of the material surface. By detecting the edge state of 2D materials in real space, it is particularly suitable for characterizing their topological properties. This paper traces the research progress of 2D TIs, and illustrates their spectroscopic evidences to resolve the nontrivial properties of the one-dimensional edge states. Combined with theoretical calculations, the topological edge states are verified to reside within the bulk energy gap, as well as being localized in the vicinity of step boundaries with a specific spatial distribution in real space. Finally, we discuss the tunability and manipulations of 2D topological materials through structural and external fields, which show promising prospects for applications in future spintronics and energy-saving devices.
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Keywords:
- scanning tunneling microscopy/
- two-dimensional topological insulators/
- topological edge states
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研究体系 代表性材料 拓扑能隙 实验进展 石墨烯及相关异质结构 Graphene ~μeV Graphene/BiTeX 70—80 meV 5d吸附原子/Graphene 0.2 eV Graphene/Re/SiC(0001) 0.1 eV Ru/Graphene 10 meV In(Tl)/Graphene ~7(20) meV Bi2Se3/Graphene/Bi2Se3 30—40 meV Sb2Te3/Graphene/Sb2Te3 1.5 meV MoTe2/ Graphene/MoTe2 3.5 meV 量子阱 HgTe/CdTe ~meV 支持[7] InAs/GaSb/AlSb ~meV 支持[9] GaN/InN/GaN ~10 meV GaAs/Ge/GaAs ~15 meV 二维层状单质或化物 单层Bi(111) 0.2—0.6 eV 支持[11] 多层Bi(111)/Si(111) 0.8 eV 支持[14] Bi单晶 — 支持[13] Bi(110) ~0.1 eV 支持[52] 4层黑磷 ~5 meV 应力或电场下Sb(111) — 单层GaAs, BBi, AlBi 三维弱拓扑结缘体 ZrTe5/HfTe5 ~0.1 eV 支持[22-24] Bi4I4 — 支持[27] Bi4Br4 ~0.18 eV Bi14Rh3I9 ~0.2 eV 支持[26] 类石墨烯六角蜂窝晶格 Silene(硅烯) 2 meV Germanene(锗烯) 23.9 meV Stanene(锡烯) ~0.1 eV 支持[35], [37] Bismuthene(铋烯) 0.67 eV 支持[38] 1 T’相过渡金属硫族化合物 1 T’-WTe2 ~0.1 eV 支持[40-42] 1 T’-WSe2 ~0.1 eV 支持[47-48] 有机材料 Ni3(C18H12N6)2 16—23 meV Ni3C12S12 22.7和9.5 meV Pb(C6H5)3/Bi(C6H5)3 43和8.6 meV δ-石墨炔 0.59 meV 石墨化-C6N6 5.50和8.27 meV 官能团修饰材料 –F, –Cl, –Br, –I, –OH修饰的锡烯/锗烯 ~0.3 eV –H, –F, –Cl, –Br, –I, –CH3修饰的单层Bi(111)/Sb(111)/双层Pb ~0.3—1 eV -Cl修饰的GaBi 0.65 eV 狄拉克半金属薄膜 Na3Bi 层厚依赖~0.3 eV 支持[57] Cd3As2 层厚依赖~0.11 eV 支持[55] 过渡金属氧化物 双层LaAuO3 0.15 eV 重金属元素化合物 TlBi 56 meV TlAs 0.131 eV TlSb 0.268 eV -
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