Superconducting quantum interference device (SQUID) is the most sensitive magnetic flux sensor known, which is widely used in biomagnetism, low-field nuclear magnetic resonance, geophysics, etc. In this paper, we introduce a high-sensitivity SQUID magnetometer, which consists of an SQUID and a flux transformer. The SQUID is first-order gradiometer configuration, which is insensitive to interference noise. The flux transformer includes a multi-turn spiral input coil and a large-sized pickup coil. And the input coil is inductively coupled to the SQUID through mutual inductance. We present an SQUID magnetometer fabricated with Nb/Al-AlO _x/Nb Josephson junction technology on a 4-inch silicon wafer at our superconducting electronics facilities. We develop a fabrication process based on selective niobium etching process consisting of five mask levels. In the first two mask levels, the trilayer is patterned by a dry etch to define base electrode, contact pads, and interconnects. The shunt resistor and a dielectric insulating layer are then deposited and patterned by using lift-off and dry etchant, respectively. Finally, the niobium wiring layer is deposited and patterned by using reactive ion etching to define input, pickup and feedback coils. The measurement of the SQUID magnetometer is performed inside a magnetically shielded room. The operating temperature is realized by immersing the SQUID into the liquid helium (4.2 K). Moreover, a superconducting niobium tube is employed to protect the SQUID from being disturbed by external environments. A homemade readout electronics instrument with low input voltage noise is used to characterize the SQUID magnetometer. The results of low-temperature measurements indicate that the magnetometer has a magnetic field sensitivity of 0.36 nT/Φ ₀and a white flux noise of 8 μΦ ₀/√Hz,corresponding to a white field noise of 2.88 fT/√Hz. This kind of SQUID magnetometer is suitable for multi-channel systems, e.g., magnetocardiography, magnetoencephalography, etc. Although the SQUID process development benefits from the rapid advance of semiconductor process technology, the uniformity of the SQUID on one wafer is fluctuated due to the film deposition. Now, we have realized a best SQUID yield of 50% on a 4-inch wafer. In the future, the SQUID chip yield should be improved by well controlling the optimizing process. The device yield is expected to reach as high as 80%.