In this paper, InGaN/GaN multiple quantum-well blue light emitting diodes (LEDs) are successfully grown on Si(110) and Si(111) substrates. The micro-structural properties of the LEDs are characterized by means of high-resolution X-ray diffraction, atomic force microscopy, Raman spectra, and temperature dependent photoluminescence measurements. The results show that the sample on Si(110) substrate exhibits the high crystal quality, weak tensile strain, and large internal quantum efficiency. The optoelectronic properties of the LED devices are also investigated. The I-V curves indicate that the LED devices fabricated on Si(110) and Si(111) substrates have similar series resistances and low reverse leakage currents, but the LED devices fabricated on Si(110) substrate possess lower turn-on voltages. The relationship between light output intensity and injection current suggests that the LED device fabricated on Si(110) substrate has a strong light output efficiency. The study on the variation of spectral peak energy with injection current of the LED device reveals that LED device on Si(110) substrate presents a smaller spectral shift range when increasing the injection current. And the smaller spectral shift range reflects the weak quantum-confined Stark effect in the device, which can be attributed to the high crystal quality and weak strain between well layer and barrier film in the LED sample grown on Si(110).