By applying planar lithography and sol-gel co-assembly methods, the designed two-dimensional defects were introduced in inverse opal films. Composite colloidal crystal films which can turn into inverse opal films after calcination were fabricated by sol-gel co-assembly method. Photoresist patterns produced by planer lithograph either on silicon or composite colloidal film/silicon substrate were used as the sacrificial structure to form the designed defects. To form the embedded defects in inverse opal films, a layer of composite colloidal crystal film was assembled on the photoresist patterns. After calcination, both PS spheres and photoresist were removed, and the designed defects were introduced in the inverse opal films. Influence of the photoresist patterns on self-assembled PS particles was also characterized.