Plasma immersion ion implantation (PIII) of non-conductor polymer materials is inherently difficult because the voltage across the sheath is reduced by the voltage drop across the insulator due to dielectric capacitance and charge accumulation on the insulator surface. Based on the particle-in-cell (PIC) model, the secondary electron emission (SEE) coefficient is related to the instant energy of implanting ions. Statistical results can be obtained through scouting each ion in the plasma sheath. The evolution of surface potential is simulated for ion implantation on insulator materials. The effects of thickness, dielectric constant and SEE coefficient on the surface bias potential and the effect of mesh-inducing are studied. For thicker non-conductor polymer, it is difficult to achieve omni-directional implantation by self-bias. The mesh-assisted PIII can improve the equivalent surface potential, suppress the emission of secondary electrons and provide an effective way for ion implantation on insulator.