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卢励吾, 张砚华, 杨国文, 王占国, J.WANG, Y.WANG, WEIKUN GE

CONDUCTION-BAND OFFSET IN PSEUDOMORPHIC GaAs/In0.2Ga0.8As QUANTUM WELL DETERMINED BY C-V PROFILING AND DLTS TECHNIQUES

LU LI-WU, ZHANG YAN-HUA, YANG GUO-WEN, WANG ZHAN-GUO, J.WANG, Y.WANG, WEIKUN GE
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  • 分别采用二种不同方法测量分子束外延(MBE)生长GaAs/In0.2Ga0.8As单量子阱结构的导带不连续量ΔEc:1) 考虑样品界面电荷修正的电容-电压(C-V)分布;2) 量子阱载流子热发射产生的电容瞬态(DLTS).C-V测得的ΔEc=0.227eV,大约相当于89% ΔEg.DLTS测得的ΔEc=0.229eV,大约相当于89.9% ΔEg.结果
    The conduction-band offset ΔEc has been determined for molecular beam epitaxy (MBE) grown GaAs/In0.2Ga0.8As single quantum well structure,by measuring the capacitance-voltage profiling, while taking into account a correction for the interface charge density, and the capacitance transient resulting from thermal emission of carrier from the quantum well, respectively.We found that ΔEc=0.227eV,corresponding to about 89% ΔEg,from the C-V profiling; and ΔEc=0.229eV, corresponding to about 89.9% ΔEg, from the deep level transient spectroscopy (DLTS) technique. The results suggest that the conduction-band discontinuity ΔEc obtained from the C-V profiling is in good agreement with that obtained from the DLTS technique.
      • 基金项目:国家自然科学基金(批准号:69776014)、香港科技大学和中国科学院半导体研究所半导体材料科学开放研究实验室资助的课题.
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    出版历程
    • 收稿日期:1997-08-20
    • 修回日期:1998-03-06
    • 刊出日期:1998-04-05

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