By using D. C. magnetron sputtering and selecting the total gas pressure 80 Pa, the deposition time 60 min and the target size 80, four amorphous YBCO/Al2O3 films were prepared with varying parameters, such as magnetic intensity, distance from the target to the substrate, and partial pressure ratio Ar/O2. The Ba and Cu concentrations relative to Y and the film thickness versus substrate position in the four samples were analyzed by Rutherford backscattering (RBS). Results have showed that the relative concentation of barium and copper were quite different at different positions and the film thickness were not uniform under disparate deposition conditions. However, one of the samples has an almost even profile in a region of 17mm around the center of the sample, where the film thickness is approximately equal to 0.13μm and the Y, Ba. Cu ratios are close to 1:2:3.